Fundamentals of Bias Temperature Instability in MOS Transistors

Fundamentals of Bias Temperature Instability in MOS Transistors
Author :
Publisher : Springer
Total Pages : 282
Release :
ISBN-10 : 9788132225089
ISBN-13 : 8132225082
Rating : 4/5 (082 Downloads)

Book Synopsis Fundamentals of Bias Temperature Instability in MOS Transistors by : Souvik Mahapatra

Download or read book Fundamentals of Bias Temperature Instability in MOS Transistors written by Souvik Mahapatra and published by Springer. This book was released on 2015-08-05 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book aims to cover different aspects of Bias Temperature Instability (BTI). BTI remains as an important reliability concern for CMOS transistors and circuits. Development of BTI resilient technology relies on utilizing artefact-free stress and measurement methods and suitable physics-based models for accurate determination of degradation at end-of-life and understanding the gate insulator process impact on BTI. This book discusses different ultra-fast characterization techniques for recovery artefact free BTI measurements. It also covers different direct measurements techniques to access pre-existing and newly generated gate insulator traps responsible for BTI. The book provides a consistent physical framework for NBTI and PBTI respectively for p- and n- channel MOSFETs, consisting of trap generation and trapping. A physics-based compact model is presented to estimate measured BTI degradation in planar Si MOSFETs having differently processed SiON and HKMG gate insulators, in planar SiGe MOSFETs and also in Si FinFETs. The contents also include a detailed investigation of the gate insulator process dependence of BTI in differently processed SiON and HKMG MOSFETs. The book then goes on to discuss Reaction-Diffusion (RD) model to estimate generation of new traps for DC and AC NBTI stress and Transient Trap Occupancy Model (TTOM) to estimate charge occupancy of generated traps and their contribution to BTI degradation. Finally, a comprehensive NBTI modeling framework including TTOM enabled RD model and hole trapping to predict time evolution of BTI degradation and recovery during and after DC stress for different stress and recovery biases and temperature, during consecutive arbitrary stress and recovery cycles and during AC stress at different frequency and duty cycle. The contents of this book should prove useful to academia and professionals alike.


Fundamentals of Bias Temperature Instability in MOS Transistors Related Books

Fundamentals of Bias Temperature Instability in MOS Transistors
Language: en
Pages: 282
Authors: Souvik Mahapatra
Categories: Technology & Engineering
Type: BOOK - Published: 2015-08-05 - Publisher: Springer

GET EBOOK

This book aims to cover different aspects of Bias Temperature Instability (BTI). BTI remains as an important reliability concern for CMOS transistors and circui
Recent Advances in PMOS Negative Bias Temperature Instability
Language: en
Pages: 322
Authors: Souvik Mahapatra
Categories: Technology & Engineering
Type: BOOK - Published: 2021-11-25 - Publisher: Springer Nature

GET EBOOK

This book covers advances in Negative Bias Temperature Instability (NBTI) and will prove useful to researchers and professionals in the semiconductor devices ar
Nanometer CMOS ICs
Language: en
Pages: 639
Authors: Harry J.M. Veendrick
Categories: Technology & Engineering
Type: BOOK - Published: 2017-04-28 - Publisher: Springer

GET EBOOK

This textbook provides a comprehensive, fully-updated introduction to the essentials of nanometer CMOS integrated circuits. It includes aspects of scaling to ev
Circadian Rhythms for Future Resilient Electronic Systems
Language: en
Pages: 215
Authors: Xinfei Guo
Categories: Technology & Engineering
Type: BOOK - Published: 2019-06-12 - Publisher: Springer

GET EBOOK

This book describes methods to address wearout/aging degradations in electronic chips and systems, caused by several physical mechanisms at the device level. Th
Fundamentals of Silicon Carbide Technology
Language: en
Pages: 565
Authors: Tsunenobu Kimoto
Categories: Technology & Engineering
Type: BOOK - Published: 2014-11-24 - Publisher: John Wiley & Sons

GET EBOOK

A comprehensive introduction and up-to-date reference to SiC power semiconductor devices covering topics from material properties to applications Based on a num