EUV Sources for Lithography

EUV Sources for Lithography
Author :
Publisher : SPIE Press
Total Pages : 1104
Release :
ISBN-10 : 0819458457
ISBN-13 : 9780819458452
Rating : 4/5 (452 Downloads)

Book Synopsis EUV Sources for Lithography by : Vivek Bakshi

Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.


EUV Sources for Lithography Related Books

EUV Sources for Lithography
Language: en
Pages: 1104
Authors: Vivek Bakshi
Categories: Art
Type: BOOK - Published: 2006 - Publisher: SPIE Press

GET EBOOK

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume conta
EUV Lithography
Language: ru
Pages: 704
Authors: Vivek Bakshi
Categories: Art
Type: BOOK - Published: 2009 - Publisher: SPIE Press

GET EBOOK

Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This b
Principles of Lithography
Language: en
Pages: 446
Authors: Harry J. Levinson
Categories: Technology & Engineering
Type: BOOK - Published: 2005 - Publisher: SPIE Press

GET EBOOK

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were
Optical and EUV Lithography
Language: en
Pages:
Authors: Andreas Erdmann
Categories:
Type: BOOK - Published: 2021-02 - Publisher:

GET EBOOK

Extreme Ultraviolet Lithography
Language: en
Pages: 245
Authors: Harry J. Levinson
Categories:
Type: BOOK - Published: 2020 - Publisher:

GET EBOOK