Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transist

A textbook designed to accompany The Society of Photo-Optical Instrumentation Engineers' short course on improving interconnect performance for increased speed

The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Low k Inter-Level Metal Dielectrics and New Contact and Barri

A complete guide to the state of the art and future direction of copper interconnect technology Owing to its performance advantages, copper metallization for IC

This book is jointly authored by leading academic and industry researchers. The material is unique in that it spans IC interconnect topics ranging from IBM's re