Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications
| Author | : Alexander Nichau |
| Publisher | : Forschungszentrum Jülich |
| Total Pages | : 199 |
| Release | : 2014-04-03 |
| ISBN-10 | : 9783893368983 |
| ISBN-13 | : 3893368981 |
| Rating | : 4/5 (981 Downloads) |
Book Synopsis Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications by : Alexander Nichau
Download or read book Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications written by Alexander Nichau and published by Forschungszentrum Jülich. This book was released on 2014-04-03 with total page 199 pages. Available in PDF, EPUB and Kindle. Book excerpt:
