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Zirconium-doped Hafnium Oxide Based Ferroelectric Materials for Memory Applications
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As data processing and storage needs continue to grow at a rapid pace, the development of innovative memory technologies is crucial. The discovery of ferroelect
Ferroelectricity in Doped Hafnium Oxide
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Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and i
Hafnium Oxide Based Ferroelectric Materials for Memory Applications
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Authors: Zhouchangwan Yu
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Innovations of memory technologies are essential for addressing the future needs of data processing and storage. The discovery of ferroelectricity in hafnia (Hf
Formation of Ferroelectricity in Hafnium Oxide Based Thin Films
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In 2011, Böscke et al. reported the unexpected discovery of ferroelectric properties in hafnia based thin films, which has since initiated many further studies
Electrical Characterisation of Ferroelectric Field Effect Transistors based on Ferroelectric HfO2 Thin Films
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Type: BOOK - Published: 2015-06-30 - Publisher: Logos Verlag Berlin GmbH

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Ferroelectric field effect transistor (FeFET) memories based on a new type of ferroelectric material (silicon doped hafnium oxide) were studied within the scope