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Type: BOOK - Published: 2000 - Publisher: The Electrochemical Society

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This volume contains the proceedings of the third international symposium on Chemical Mechanical Planarization integrated circuit device manufacturing held at t
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Chemical mechanical planarization, or chemical mechanical polishing as it is simultaneously referred to, has emerged as one of the critical processes in semicon
Chemical-Mechanical Planarization of Semiconductor Materials
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This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor te
Chemical Mechanical Planarization IV
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Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing
Language: en
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Authors: Robert Leon Opila
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Type: BOOK - Published: 1998 - Publisher: The Electrochemical Society

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