Related Books

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment
Language: en
Pages: 367

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment

Authors: V. Narayanan
Categories: Gate array circuits
Type: BOOK - Published: 2009-05 - Publisher: The Electrochemical Society

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This issue of ¿ECS Transactions¿ describes processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel e
Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2
Language: en
Pages: 472

Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2

Authors: Fred Roozeboom
Categories: Gate array circuits
Type: BOOK - Published: 2006 - Publisher: The Electrochemical Society

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These proceedings describe processing, materials, and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topic
Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS
Language: en
Pages: 658

Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS

Authors:
Categories: Technology & Engineering
Type: BOOK - Published: 2005 - Publisher:

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Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment
Language: en
Pages: 426

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment

Authors: E. P. Gusev
Categories: Science
Type: BOOK - Published: 2010-04 - Publisher: The Electrochemical Society

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These proceedings describe processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics
Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment
Language: en
Pages: 488

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment

Authors: P. J. Timans
Categories: Gate array circuits
Type: BOOK - Published: 2008-05 - Publisher: The Electrochemical Society

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This issue describes processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: stra