This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the phy

This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contribute

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of

Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and c

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system wit