The microelectronics industry has made remarkable progress with the development of integrated circuit (IC) technology which depends on the advance of micro-fabr

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist material

Many problems exist in current photoresist designs that will limit their ability to obtain the performance required for future generations of integrated circuit

Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This b